Browsing by Subject "Electrons"
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Axial distribution of plasma fluctuations, plasma parameters, deposition rate and grain size during copper deposition
(Taylor and Francis Inc., 2017)Floating potential fluctuations, plasma parameters and deposition rate have been investigated as a function of axial distance during deposition of copper in direct current (DC) magnetron sputtering system. Fluctuations ... -
Paschen curve approach to investigate electron density and deposition rate of Cu in magnetron sputtering system
(Taylor and Francis Inc., 2016)In this work, Paschen curve for argon gas was obtained during copper deposition using a DC magnetron sputtering system. Five process parameters of Paschen curve were used to obtain the electron density and deposition rate ...