Thickness-dependent magnetic and transport properties of La0.5Sr0.5MnO3 thin films deposited by DC magnetron sputtering on the LaAlO3 substrate

dc.contributor.authorYadav, Kamlesh
dc.contributor.authorSingh, H. K.
dc.contributor.authorMaurya, K. K.
dc.contributor.authorVarma, G. D.
dc.contributor.authorYadav, K.
dc.contributor.authorSingh, H.K.
dc.contributor.authorMaurya, K.K.
dc.contributor.authorVarma, G.D.
dc.date.accessioned2018-01-10T05:46:19Z
dc.date.accessioned2024-08-13T12:45:34Z
dc.date.available2018-01-10T05:46:19Z
dc.date.available2024-08-13T12:45:34Z
dc.date.issued2018
dc.description.abstractThickness-dependent structural, magnetic and transport properties of La0.5Sr0.5MnO3 (LSMO) thin films have been studied. A series of the LSMO films with thickness 30, 60, 125 and 300?nm have been deposited on the LaAlO3 substrate using DC magnetron sputtering. The paramagnetic to ferromagnetic transition at TC is followed by antiferromagnetic ordering at TN in all films. It is also found that all LSMO films have TC lower than that of bulk LSMO. A small variation of TC is observed on increasing the film thickness. However, TN is found to rise with increase in the film thickness. The 60?nm-thick film shows a wide insulator to metal transition. The resistivity above 240?K of the films with various thicknesses is consistent with a small polaronic hopping conductivity. The polaronic formation energy EA rises with the increase of the film thickness except for 60?nm thin film, where a small decline in EA is observed. The correlation between observed structural, magnetic and electrical properties with the thickness of the films has been discussed in this paper. ? 2017, Springer-Verlag GmbH Germany, part of Springer Nature.en_US
dc.identifier.citationYadav, K., Singh, H. K., Maurya, K. K., & Varma, G. D. (2018). Thickness-dependent magnetic and transport properties of La<inf>0.5</inf>Sr<inf>0.5</inf>MnO<inf>3</inf>thin films deposited by DC magnetron sputtering on the LaAlO<inf>3</inf>substrate. Applied Physics A: Materials Science and Processing, 124(1). doi: 10.1007/s00339-017-1494-0en_US
dc.identifier.doi10.1007/s00339-017-1494-0
dc.identifier.issn9478396
dc.identifier.urihttps://kr.cup.edu.in/handle/32116/529
dc.identifier.urlhttps://link.springer.com/article/10.1007%2Fs00339-017-1494-0
dc.language.isoenen_US
dc.publisherSpringer Verlagen_US
dc.subjectAluminum compoundsen_US
dc.subjectAntiferromagnetismen_US
dc.subjectFilm thicknessen_US
dc.subjectLanthanum compoundsen_US
dc.subjectMagnetismen_US
dc.subjectMagnetron sputteringen_US
dc.subjectManganese compoundsen_US
dc.subjectMetal insulator transitionen_US
dc.subjectThick filmsen_US
dc.subjectTransport propertiesen_US
dc.subjectAntiferromagnetic orderingsen_US
dc.subjectDc magnetron sputteringen_US
dc.subjectFerromagnetic transitionsen_US
dc.subjectHopping conductivityen_US
dc.subjectInsulator-to-metal transitionsen_US
dc.subjectMagnetic and electrical propertiesen_US
dc.subjectMagnetic and transport propertiesen_US
dc.subjectThickness of the filmen_US
dc.subjectThin filmsen_US
dc.titleThickness-dependent magnetic and transport properties of La0.5Sr0.5MnO3 thin films deposited by DC magnetron sputtering on the LaAlO3 substrateen_US
dc.title.journalApplied Physics A: Materials Science and Processing
dc.typeArticleen_US

Files

Original bundle

Now showing 1 - 1 of 1
Thumbnail Image
Name:
1.pdf
Size:
2.03 MB
Format:
Adobe Portable Document Format

License bundle

Now showing 1 - 1 of 1
No Thumbnail Available
Name:
license.txt
Size:
1.71 KB
Format:
Plain Text
Description: