Study of Plasma Parameters and Deposition Rate of Titanium Thin Film in a DC Magnetron Sputtering Method

Abstract

Abstract: The plasma parameters like electron temperature (Te) and electron density (ne) on the deposition rate in turn thickness of titanium thin film at different axial and radial positions were studied quantitatively in a DC magnetron sputtering unit. The electron flux (EF) and the electron energy distribution function (EEDF) methods were used to calculate Te and ne using the data collected from multi Langmuir probe setup. The electron density distribution was obtained through the particle-in-cell�Monte Carlo collisions (PI-C?MCC) simulation method and from IV graph using a Langmuir probe. It was observed that both Te and ne decreased with the increase in axial and radial distances from the cathode centre. The deposition rate of titanium thin films was found to follow the same pattern as Te and ne. The influence of the magnetic field configuration and change of the plasma parameters on the deposition rate were analyzed in the light of simulated and experimental results obtained. � 2022, Pleiades Publishing, Ltd.